Deposition of sputtered iridium oxide : influence of oxygen flow in the reactor on the film properties
Slavcheva, Evelina; Schnakenberg, Uwe; Mokwa, Wilfried
Amsterdam [u.a.] : Elsevier (2006)
Journal Article
In: Applied surface science
Volume: 253
Issue: 4
Page(s)/Article-Nr.: 1964-1969
Institutions
- Chair of Materials in Electrical Engineering I and Institute of Materials in Electrical Engineering [611510]
Identifier
- DOI: 10.1016/j.apsusc.2006.03.073
- RWTH PUBLICATIONS: RWTH-CONV-032916