Deposition of sputtered iridium oxide : influence of oxygen flow in the reactor on the film properties

Slavcheva, Evelina; Schnakenberg, Uwe; Mokwa, Wilfried

Amsterdam [u.a.] : Elsevier (2006)
Journal Article

In: Applied surface science
Volume: 253
Issue: 4
Page(s)/Article-Nr.: 1964-1969

Institutions

  • Chair of Materials in Electrical Engineering I and Institute of Materials in Electrical Engineering [611510]

Identifier