Polysilicon sacrificial layer etching using ClF3 for thin film encapsulation of silicon acceleration sensors with high aspect ratio
Metzger, Lars; Fischer, Frank; Mokwa, Wilfried
Amsterdam [u.a.] : Elsevier (2007)
Journal Article
In: Sensors and actuators / A, Physical
Volume: 133
Issue: 1
Page(s)/Article-Nr.: 259-265
Institutions
- Chair of Materials in Electrical Engineering I and Institute of Materials in Electrical Engineering [611510]
Identifier
- DOI: 10.1016/j.sna.2006.03.017
- RWTH PUBLICATIONS: RWTH-CONV-032924